Artificial intelligence is one of the driving forces in today’s semiconductor industry, with more traditional market drivers like high performance compute and smart phones continuing to play important ...

Semiconductor devices are becoming thinner and more complex, making thin deposited films even harder to measure and control. With 3nm node devices in production and 2nm nodes ramping toward ...

The Ellipsometry is a total optical measurement method. This technique is used to measure the change of polarization of light when passing through a medium. Due to the layer structure during ...

(Nanowerk News) Two-dimensional (2D) material flakes consist of single to few atomic layers, granting them extraordinary quantum properties, which are not observed in everyday materials. As a result, ...

Metrology supplier Nanometrics Inc. today unveiled an integrated metrology tool combining ultraviolet spectroscopic ellipsometry and deep ultraviolet (DUV) spectroscopic reflectometry. In dielectric ...

Ellipsometry Porosimetry (EP) is used to measure the thickness of the materials and how its optical properties change throughout adsorption and desorption of a volatile species either under less ...

(Nanowerk News) Scientists from Skoltech and their colleagues from Russia and Finland have figured out a non-invasive way to measure the thickness of single-walled carbon nanotube films, which may ...

Researchers typically use Raman spectroscopy to check the structural quality and thickness of graphene, but because the technique can only cover a small area in a given time, it’s painfully slow. It ...